Chemical composition: 99.2%
Purity: 99.2% 2N2

Thickness: 10mm
Pošaljite upit
Opis
Tehnički parametri

 

1. Application as a thin film deposition material

are often used in sputtering and chemical vapor deposition (CVD) technology. Sputtering refers to the process of high-energy ions hitting the surface of the target material, causing its atoms to detach and deposit on the substrate to form a thin film. Zirconium targets are ideal materials for preparing high-quality thin films due to their high purity and good film uniformity.

2. Special role in integrated circuit manufacturing

Zirconium targets have unique advantages in integrated circuit manufacturing, especially in high-density and high-precision circuit design. Their excellent thermal conductivity and low resistivity make them an ideal choice.

 

 

1. Free samples

2. Rich market forecast suggestions

3. Timely response, quick feedback on customer needs

4. Lock the price to help you save costs trade guarantee

5. Advanced production line, strong production capacity

6. Professional order system, complete operation

 

 

<300mm

<300mm

>0.1mm

<300mm

 

 

Q1: Can I get samples for testing?

Q2: Can I use our own packaging?

Q3: Do you have an inspection procedure for evaporation materials?

A: 100% self-inspection before packaging

Q4: What do I consider when I choose an evaporation material?

Q5: What do I consider when I choose an evaporation material supplier?

 

 

zr sputtering target company

Zirconium sputtering target company

Our company has its own SOP system for production, sales, and after-sales service. I hope we can provide you with good and professional services!